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http://dspace.cityu.edu.hk/handle/2031/4823
Title: | Study of EM-field inside metallic enclosure by using statistical method and measurement |
Authors: | Szeto, John Chun Chung |
Department: | Department of Electronic Engineering |
Issue Date: | 2007 |
Supervisor: | Supervisor: Dr. Leung, Peter S W.; Assessor: Dr. Siu, Timothy Y M |
Abstract: | It is a concern of the electromagnetic field that inside a metallic enclosure may give resonance affect to human safety. The radio frequency propagation in a metallic enclosure was studied in this project by a field statistical model and measurement data. This approach enables a fast computation of the field distribution in a complex metallic resonance environment. The statistical distribution of Electric field could be found faster than the numerical method of FDTD by over 60 times. The field statistics of metallic enclosure have been investigated by using a 3D Green’s function and found to be in Raleigh distribution that well match the theory of published paper. The results summarize the effect of different dimensions of enclosures, sources and wall materials to the statistic model of electromagnetic field inside the metallic enclosure. The Mean of Electric field was found to be increased more than 30% when the location of mobile phone was near to the wall of elevator. |
Appears in Collections: | Electrical Engineering - Undergraduate Final Year Projects |
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fulltext.html | 164 B | HTML | View/Open |
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